Ebook: Developments in Surface Contamination and Cleaning - Particle Deposition, Control and Removal

The authors have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.

Topics covered include:

Systems analysis approach to contamination control

Physical factors that influence the behavior of particle deposition in enclosures

Overview of current yield models and description of advanced models

Types of strippable coatings

Properties and applications of these coatings for removal of surface contaminants

In-depth coverage of ultrasonic cleaning

Contamination and cleaning issues at the nanoscale

Experimental results illustrating the impact of model parameters on the removal of particle contamination

The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. This book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography, and joining (adhesive bonding).
Content:
Front Matter
• Preface
• Table of Contents
1. Particle Deposition onto Enclosure Surfaces
2. Contamination Control: A Systems Approach
3. Particles in Semiconductor Processing
4. Continuous Contamination Monitoring Systems
5. Strippable Coatings for Removal of Surface Contaminants
6. Ultrasonic Cleaning
Index