Ebook: Developments in Surface Contamination and Cleaning - Fundamentals and Applied Aspects

Surface contamination is of cardinal importance in a host of technologies and industries, ranging from microelectronics to optics to automotive to biomedical. Thus, the need to understand the causes of surface contamination and their removal is very patent. Generally speaking, there are two broad categories of surface contaminants: film-type and particulates. In the world of shrinking dimensions, such as the ever-decreasing size of microelectronic devices, there is an intensified need to understand the behavior of nanoscale particles and to devise ways to remove them to an acceptable level. Particles which were functionally innocuous a few years ago are "killer defects" today, with serious implications for yield and reliability of the components. This amply referenced and illustrated book addresses the sources, detection, characterization and removal of both kinds of contaminants, as well as ways to prevent surfaces from being contaminated. A number of techniques to monitor the level of cleanliness are also discussed and a special emphasis is placed on the behavior of nanoscale particles throughout the book.
Content:
Front Matter
• Table of Contents
•Part I. Fundamentals 1. The Physical Nature of Very, Very Small Particles and its Impact on Their Behavior
2. Elucidating the Fundamental Interactions of Very Small Particles: Ultrafast Science
3. Transport and Deposition of Aerosol Particles
4. Relevance of Particle Transport in Surface Deposition and Cleaning
5. Tribological Implication of Particles
6. Airborne Molecular Contamination: Contamination on Substrates and the Environment in Semiconductors and other Industries
7. Aspects of Particle Adhesion and Removal
8. Relevance of Electrostatic Discharge Controls to Particle Contamination in Cleanroom Environments
•Part II. Characterization of Surface Contaminants 9. Electron Microscopy Techniques for Imaging and Analysis of Nanoparticles
10. Surface Analysis Methods for Contaminant Identification
11. Ionic Contamination and Analytical Techniques for Ionic Contaminants
12. Relevance of Colorimetric Interferometry for Thin Surface Film Contaminants
13. Wettability Techniques to Monitor the Cleanliness of Surfaces
•Part III. Methods for Removal of Surface Contamination 14. The Use of Surfactants to Enhance Particle Removal from Surfaces
15. Cleaning with Solvents
16. Removal of Particles by Chemical Cleaning
17. Cleaning Using a High-Speed Impinging Jet
18. Microabrasive Precision Cleaning and Processing Technology
19. Cleaning Using Argon/Nitrogen Cryogenic Aerosols
20. Carbon Dioxide Snow Cleaning
21. Coatings for Prevention or Deactivation of Biological Contamination
22. A Detailed Study of Semiconductor Wafer Drying
Index