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The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.




The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and superhard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their quality.
Application of Particle and Laser Beams in Materials Technology provides an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale are presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection. The book is divided into six thematic units: Fundamentals, Surface Analysis Techniques, Laser Beams in Materials Technology, Accelerator-Based Techniques in Materials Technology, Materials Modification and Synchrotron Radiation.



The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and superhard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their quality.
Application of Particle and Laser Beams in Materials Technology provides an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale are presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection. The book is divided into six thematic units: Fundamentals, Surface Analysis Techniques, Laser Beams in Materials Technology, Accelerator-Based Techniques in Materials Technology, Materials Modification and Synchrotron Radiation.

Content:
Front Matter....Pages i-xi
Front Matter....Pages xiii-xiii
Fundamental Aspects of Ion Electron Interactions....Pages 1-20
Fundamentals of Ion-Solid Interactions: Atomic Collisions....Pages 21-36
Excitation and Ionization In Fast Ion-Atom Collisions Due to Projectile — Electron — Target — Electron Interactions....Pages 37-52
Radiation Induced Point Defects and Diffusion....Pages 53-76
High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams....Pages 77-94
Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties....Pages 95-112
Front Matter....Pages 113-113
An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds....Pages 115-131
Depth Profiling in Combination with Sputtering....Pages 133-150
A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector....Pages 151-158
Thermal He Atom Scattering for the Study of Surface Systems: K on Si(001)....Pages 159-165
Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO2 under Ion Bombardment....Pages 167-173
Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics....Pages 175-181
Front Matter....Pages 183-183
The Raman Approach to Materials Science....Pages 185-217
Laser-Material Interaction. Plasma Formation and Applications....Pages 219-235
Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids....Pages 237-258
Laser Deposition and Patterning of Diamond Films....Pages 259-267
Laser-Raman Spectroscopy of Some Lanthanide/Hgl2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL)....Pages 269-280
Front Matter....Pages 281-284
Accelerators in Materials Research....Pages 285-285
Application of Elastic Recoil Detection in Materials Analysis....Pages 287-300
Front Matter....Pages 301-321
Applications of High Energy Ion Scattering in Materials Science....Pages 285-285
High Energy Heavy Ion RBS, ERDA and Channelling....Pages 323-340
Some New Detection Techniques for Light-Ion Scattering Analysis....Pages 341-357
Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na....Pages 359-374
Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis....Pages 375-386
Thin Layer Activation in Materials Technology....Pages 387-398
Optimum Industrial Application of the Thin Layer Activation Technique....Pages 399-413
Ion Beam Analysis of Glasses — Industrial Applications....Pages 415-426
Nuclear Reaction Analysis of Corroded Glass Surfaces....Pages 427-435
Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials....Pages 437-442
Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE....Pages 443-461
Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems....Pages 463-470
Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips....Pages 471-476
Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium....Pages 477-484
Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence....Pages 485-492
Modern Technological Projects with High Power Electron Beams....Pages 493-500
Computer-Aided Design of Technological Electron-Optical Systems....Pages 501-512
Front Matter....Pages 513-524
Ion Beam Mixing....Pages 525-525
Materials Modification Using Electron Beams....Pages 527-555
Deposition and Etching Mechanisms in Plasma Thin Film Processes....Pages 557-580
Front Matter....Pages 581-593
Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation....Pages 525-525
SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy....Pages 595-602
The Key Role of Electron Beams in IC Technology....Pages 603-612
Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin Films Prepared by RF-Sputtering: Growth and Physical Characterisation....Pages 613-621
Front Matter....Pages 623-629
Synchrotron Radiation Sources for Materials Technology....Pages 631-631
Characterisation of Nearly Stoichiometric Buried SixNy Films with EXAFS and NEXAFS....Pages 633-651
Back Matter....Pages 653-660
....Pages 661-668
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