Ebook: Particles on Surfaces 2: Detection, Adhesion, and Removal

This volume documents the proceedings of the Second Symposium on Particles on Surfaces: Detection, Adhesion and Removal held as part of the 19th Annual Meeting of the Fine Particle Society in Santa Clara, California, July 20-25, 1988. The premier symposium on this topic was l organized in 1986 and has been properly chronicled . Based on the success of these two events and the high interest evinced by the technical community, we plan to regularly hold symposia on this topic on a biennial basis and the next one is slated for August 20-24, 1990 in San Diego, California. l As pointed out in the Preface to the first volume , the topic of particles on surfaces is of paramount importance in legion of technological areas. Particularly in the semiconductor device fabrication area, all signals indicate that the understanding of the behavior of particles on surfaces and their removal will attain heightened importance in the times to come. As the device dimensions are shrinking at an accelerated pace, so the benign particles of today will become the killer defects in the not too distant future. The tempo of research and development activity in the field of particles on surfaces is very high, and better and novel ways are continuously being devised to remove smaller and smaller particles.

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Content:
Front Matter....Pages i-viii
Front Matter....Pages 1-1
The Adhesion of Small Particles to a Surface....Pages 3-17
Application of Impact Adhesion Theory to Particle Kinetic Energy Loss Measurements....Pages 19-34
Adhesion Force Due To a Meniscus in a Crossed-Fiber System....Pages 35-48
Adhesion Induced Deformations between Particles and Substrates....Pages 49-58
The Effect of External Noises on the Attachment of Particles to Solid Surfaces....Pages 59-66
Measurement of Detachable Submicrometer Particles and Surface Cleanliness of Clean Room Garments....Pages 67-76
Accumulation of Particle Derived Ionic Contaminants on Electronic Equipment: Airborne Concentrations and Deposition Velocities....Pages 77-85
Adhesion of Ash Particles on Heat Transfer Surfaces in Coal Combustion Applications: Mechanisms and Implications....Pages 87-97
Factors Affecting Adhesion of Drug Particles to Surfaces in Pharmaceutical Systems....Pages 99-111
Front Matter....Pages 113-113
The Role of Infrared and Raman Microspectroscopies in the Characterization of Particles on Surfaces....Pages 115-142
Infrared and Raman Microspectroscopy: An Overview of their Use in the Identification of Microscopic Particulates....Pages 143-161
Particle Identification By Auger Electron Spectroscopy....Pages 163-169
Identification and Characterization of Nonmetallic Particulate Contamination Removed from Aerospace Components....Pages 171-180
Surface Particle Inspection Plans in Semiconductor Manufacturing....Pages 181-188
Particulate Generation and Detection on Surfaces....Pages 189-194
Identification of Small Particles on a Silicon Wafer....Pages 195-200
The Evaluation of PWA and SMA Cleanliness Levels for “In-Line” Defluxing by High Performance Liquid Chromatography....Pages 201-213
Front Matter....Pages 215-215
Wear Resistant Coatings Reduce Particulate Contamination in a Magnetic Disk Drive....Pages 217-234
Particle Reduction on Silicon Wafers as a Result of Isopropyl Alcohol Vapor Displacement drying after Wet Processing....Pages 235-243
Implications of Particle Contamination for Thin Film Growth....Pages 245-251
Front Matter....Pages 215-215
Implications of Particulate Contamination in E-Beam Lithography....Pages 253-265
Front Matter....Pages 267-267
Enhanced Removal of Sub-micron Particles from Surfaces by High Molecular Weight Fluorocarbon Surfactant Solutions....Pages 269-282
Comparison of Freon with Water Cleaning Processes for Disk-drive Parts....Pages 283-295
Ultrasonic and Hydrodynamic Techniques for Particle Removal from Silicon Wafers....Pages 297-306
New Sonic Cleaning Technology for Particle Removal from Semiconductor Surfaces....Pages 307-315
Back Matter....Pages 317-328

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Content:
Front Matter....Pages i-viii
Front Matter....Pages 1-1
The Adhesion of Small Particles to a Surface....Pages 3-17
Application of Impact Adhesion Theory to Particle Kinetic Energy Loss Measurements....Pages 19-34
Adhesion Force Due To a Meniscus in a Crossed-Fiber System....Pages 35-48
Adhesion Induced Deformations between Particles and Substrates....Pages 49-58
The Effect of External Noises on the Attachment of Particles to Solid Surfaces....Pages 59-66
Measurement of Detachable Submicrometer Particles and Surface Cleanliness of Clean Room Garments....Pages 67-76
Accumulation of Particle Derived Ionic Contaminants on Electronic Equipment: Airborne Concentrations and Deposition Velocities....Pages 77-85
Adhesion of Ash Particles on Heat Transfer Surfaces in Coal Combustion Applications: Mechanisms and Implications....Pages 87-97
Factors Affecting Adhesion of Drug Particles to Surfaces in Pharmaceutical Systems....Pages 99-111
Front Matter....Pages 113-113
The Role of Infrared and Raman Microspectroscopies in the Characterization of Particles on Surfaces....Pages 115-142
Infrared and Raman Microspectroscopy: An Overview of their Use in the Identification of Microscopic Particulates....Pages 143-161
Particle Identification By Auger Electron Spectroscopy....Pages 163-169
Identification and Characterization of Nonmetallic Particulate Contamination Removed from Aerospace Components....Pages 171-180
Surface Particle Inspection Plans in Semiconductor Manufacturing....Pages 181-188
Particulate Generation and Detection on Surfaces....Pages 189-194
Identification of Small Particles on a Silicon Wafer....Pages 195-200
The Evaluation of PWA and SMA Cleanliness Levels for “In-Line” Defluxing by High Performance Liquid Chromatography....Pages 201-213
Front Matter....Pages 215-215
Wear Resistant Coatings Reduce Particulate Contamination in a Magnetic Disk Drive....Pages 217-234
Particle Reduction on Silicon Wafers as a Result of Isopropyl Alcohol Vapor Displacement drying after Wet Processing....Pages 235-243
Implications of Particle Contamination for Thin Film Growth....Pages 245-251
Front Matter....Pages 215-215
Implications of Particulate Contamination in E-Beam Lithography....Pages 253-265
Front Matter....Pages 267-267
Enhanced Removal of Sub-micron Particles from Surfaces by High Molecular Weight Fluorocarbon Surfactant Solutions....Pages 269-282
Comparison of Freon with Water Cleaning Processes for Disk-drive Parts....Pages 283-295
Ultrasonic and Hydrodynamic Techniques for Particle Removal from Silicon Wafers....Pages 297-306
New Sonic Cleaning Technology for Particle Removal from Semiconductor Surfaces....Pages 307-315
Back Matter....Pages 317-328
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