Ebook: Microelectronic Materials and Processes
- Tags: Optical and Electronic Materials, Characterization and Evaluation of Materials
- Series: NATO ASI Series 164
- Year: 1989
- Publisher: Springer Netherlands
- Edition: 1
- Language: English
- pdf
The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.
Content:
Front Matter....Pages i-xiv
Silicon Crystal Growth....Pages 1-24
Silicon Epitaxy....Pages 25-78
Silicon Oxidation....Pages 79-132
Physical Vapor Deposition....Pages 133-201
Chemical Vapor Deposition....Pages 203-246
Dielectric Materials....Pages 247-273
Properties and Applications of Silicides....Pages 275-323
Forefront of Photolithographic Materials....Pages 325-407
Fine-Line Lithography....Pages 409-458
Dry Etching Processes....Pages 459-520
Ion Implantation....Pages 521-581
Diffusion in Semiconductors....Pages 583-634
Interconnect Materials....Pages 635-678
Imperfection and Impurity Phenomena....Pages 679-773
Process Simulation....Pages 775-844
Diagnostic Techniques....Pages 845-979
Back Matter....Pages 981-985
Content:
Front Matter....Pages i-xiv
Silicon Crystal Growth....Pages 1-24
Silicon Epitaxy....Pages 25-78
Silicon Oxidation....Pages 79-132
Physical Vapor Deposition....Pages 133-201
Chemical Vapor Deposition....Pages 203-246
Dielectric Materials....Pages 247-273
Properties and Applications of Silicides....Pages 275-323
Forefront of Photolithographic Materials....Pages 325-407
Fine-Line Lithography....Pages 409-458
Dry Etching Processes....Pages 459-520
Ion Implantation....Pages 521-581
Diffusion in Semiconductors....Pages 583-634
Interconnect Materials....Pages 635-678
Imperfection and Impurity Phenomena....Pages 679-773
Process Simulation....Pages 775-844
Diagnostic Techniques....Pages 845-979
Back Matter....Pages 981-985
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