Ebook: Erosion and Growth of Solids Stimulated by Atom and Ion Beams

The members of the organising Committee and their colleagues have, for many years been investigating the evol­ ution of the fas'cinating surface features which develop during sputtering erosion of solids. Such experimental, theoretical and computational studies have also been carried out in many international laboratories and, as well as much cow~onality and agreement, substantial disagreements were unresolved. In view of the increasing importance of such processes in technological applications such as microlitho­ graphic etching for the patterning of solid state devices and in fusion technology it was felt opportune to hold a meeting in this area. Furthermore the use of energetic atomic and ion fluxes is also becoming of increasing importance in assisting or modifying the growth of thin films in a number of important industrial processes and it was therefore rational to combine the, study of both erosional and growth processes in a single meeting. These proceedings include 16 invited review and 15 oral or poster presented contributions to the NATO Advanced Study Institute on the "Erosion and Growth of Solids Stimulated by Atom and Ion Beams". The review contributions span the range from the fundamental concepts of ballistic sputtering, and how this influences surface morphology evolution, through processes involving entrapment of incident species to mechanisms involved in'the use of chemically reactive ion species. Further reviews outline the influence of energetic irradiation upon surface growth by atomic deposition whilst others discuss technologkal applications of both areas of growth and erosion.

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Content:
Front Matter....Pages I-XI
Physical Sputtering of Elemental Metals and Semiconductors....Pages 1-24
Ion Implantation Mechanisms and Related Computational Issues....Pages 25-40
The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation....Pages 41-69
Theory of Surface Erosion and Growth....Pages 70-97
On the Composition of the Sputtered Flux from Metal Targets and their Compounds....Pages 98-102
Geometric Methods of Analysis....Pages 103-120
Surface Topographical Evolution: Computational Methods of Analysis....Pages 121-145
Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer....Pages 146-150
Experimental Studies of Morphology Development....Pages 151-173
Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Structures....Pages 174-180
Effects of Surface Impurities and Diffusion on Ion Bombardment-Induced Topography Formation....Pages 181-199
Ion Trapping and Cluster Growth....Pages 200-221
Bubbles, Blisters, and Exfoliation....Pages 222-246
Examples of Ion Bombardment Effects On Film Growth and Erosion Processes — Plasma and Beam Experiments....Pages 247-274
On The Modification of Metal/Ceramic Interfaces by Low Energy Ion/Atom Bombardment During Film Growth....Pages 275-280
Plasma Etching for Silicon Device Technology....Pages 281-296
Reactive Ion Etching of GaAs and Related III-V Compounds....Pages 297-315
Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification....Pages 316-323
Molecular Beam Epitaxy And Selective MBE Deposition of GaAs Device Structures....Pages 324-337
Applications of Ion Beams in Microlithography....Pages 338-365
In Situ Ion Beam Processing for Josephson Junction Fabrication....Pages 366-369
Effect of Ion Implantation on Subsequent Erosion and Wear Behavior of Solids....Pages 370-393
Problems, Prospects and Applications of Erosional/Depositional Phenomena....Pages 394-422
The Influence of Incidence Angle on Damage Production in In+ Ion Implanted Si....Pages 423-429
Striation Production by Grazing ION Incidence on Si....Pages 430-434
Influence of Lattice Defects Produced by ION Implantation on Electrical and Optical Properties of Bulk-Barrier-Diodes....Pages 435-439
Influence of the Target Environment on Angular Distribution of Sputtered Particles....Pages 440-443
Simulation of Near Atomic Scale Sputter Induced Morphology....Pages 444-452
Epitaxy of Erbium on Tungsten....Pages 453-456
Growth of Thin Films by UHV ION Beam Sputtering Deposition Technique....Pages 457-460
Microstructural Analysis of Electronically Conductive Ceramic Coatings Synthesized by Reactive ION Plating and Sputter Deposition....Pages 461-461

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Content:
Front Matter....Pages I-XI
Physical Sputtering of Elemental Metals and Semiconductors....Pages 1-24
Ion Implantation Mechanisms and Related Computational Issues....Pages 25-40
The Theory of the Preferential Sputtering of Alloys, Including the Role of Gibbsian Segregation....Pages 41-69
Theory of Surface Erosion and Growth....Pages 70-97
On the Composition of the Sputtered Flux from Metal Targets and their Compounds....Pages 98-102
Geometric Methods of Analysis....Pages 103-120
Surface Topographical Evolution: Computational Methods of Analysis....Pages 121-145
Preferential Sputtering of Tantalum Oxide: Reemission of Helium and Transient Effects in the Altered Layer....Pages 146-150
Experimental Studies of Morphology Development....Pages 151-173
Investigation of Microtopography Induced during Sputter Depth Profiling of Ni/Cr Multilayered Structures....Pages 174-180
Effects of Surface Impurities and Diffusion on Ion Bombardment-Induced Topography Formation....Pages 181-199
Ion Trapping and Cluster Growth....Pages 200-221
Bubbles, Blisters, and Exfoliation....Pages 222-246
Examples of Ion Bombardment Effects On Film Growth and Erosion Processes — Plasma and Beam Experiments....Pages 247-274
On The Modification of Metal/Ceramic Interfaces by Low Energy Ion/Atom Bombardment During Film Growth....Pages 275-280
Plasma Etching for Silicon Device Technology....Pages 281-296
Reactive Ion Etching of GaAs and Related III-V Compounds....Pages 297-315
Ion Beam Enhanced Deposition and Dynamic Ion Mixing for Surface Modification....Pages 316-323
Molecular Beam Epitaxy And Selective MBE Deposition of GaAs Device Structures....Pages 324-337
Applications of Ion Beams in Microlithography....Pages 338-365
In Situ Ion Beam Processing for Josephson Junction Fabrication....Pages 366-369
Effect of Ion Implantation on Subsequent Erosion and Wear Behavior of Solids....Pages 370-393
Problems, Prospects and Applications of Erosional/Depositional Phenomena....Pages 394-422
The Influence of Incidence Angle on Damage Production in In+ Ion Implanted Si....Pages 423-429
Striation Production by Grazing ION Incidence on Si....Pages 430-434
Influence of Lattice Defects Produced by ION Implantation on Electrical and Optical Properties of Bulk-Barrier-Diodes....Pages 435-439
Influence of the Target Environment on Angular Distribution of Sputtered Particles....Pages 440-443
Simulation of Near Atomic Scale Sputter Induced Morphology....Pages 444-452
Epitaxy of Erbium on Tungsten....Pages 453-456
Growth of Thin Films by UHV ION Beam Sputtering Deposition Technique....Pages 457-460
Microstructural Analysis of Electronically Conductive Ceramic Coatings Synthesized by Reactive ION Plating and Sputter Deposition....Pages 461-461
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