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The characterization of thin films and solid interfaces as well as the determina­ tion of concentration profiles in thin solid layers is one of the fields which re­ quire a rapid transfer of the results from basic research to technological applica­ tions and developments. It is the merit of the Dr. Wilhelm Heinrich and Else Heraeus-Stiftung to promote such a transfer by organizing high standard seminars mostly held at the "Physikzentrum" in Bad Honnef near Bonn. The present book has been stimulated by one of these seminars assembling most of the invited speakers as co-authors. The editor appreciates the cooperation of his colleagues contributing to this book. H. Oechsner Kaiserslautern, April 1984 v Contents 1. Introduction. ByH. Oechsner . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1. 1 Requirements for Thin Film and In-Depth Analysis . . . . . . . . . . . . . . . . . . . 1 1. 2 Object and Outl i ne of the Book . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 2 4 References 2. The Application of Beam and Diffraction Techniques to Thin Film and Surface Micro-Analysis. By H. W. Werner (With 25 Fi gures) . . . . . . . . . . . . . . . . 5 2. 1 Methods to Determine Chemical Structures in Material Research 5 2. 2 Selected Analytical Features Used to Determine Chemical Structures 9 2. 2. 1 Depth Profi 1 ing . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 9 a) Destructive Depth Profiling b) Nondestructive Methods for Depth and Thin Film Analysis 15 19 2. 2. 2 Microspot Analysis and Element Imaging 2. 3 Determining Physical Structures in Material Research . . . . . . . . . . . . . . . 27 2. 3. 1 X-Ray Diffraction . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 27 2. 3. 2 X-Ray Double Crystal Diffraction . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28 2. 3.








Content:
Front Matter....Pages I-XI
Introduction....Pages 1-4
The Application of Beam and Diffraction Techniques to Thin Film and Surface Micro-Analysis....Pages 5-38
Depth Profile and Interface Analysis of Thin Films by AES and XPS....Pages 39-61
Secondary Neutral Mass Spectrometry (SNMS) and Its Application to Depth Profile and Interface Analysis....Pages 63-85
In-Situ Laser Measurements of Sputter Rates During SIMS/AES In-Depth Profiling....Pages 87-102
Physical Limitations to Sputter Profiling at Interfaces — Model Experiments with Ge/Si Using KARMA....Pages 103-139
Depth Resolution and Quantitative Evaluation of AES Sputtering Profiles....Pages 141-158
The Theory of Recoil Mixing in Solids....Pages 159-200
Back Matter....Pages 201-208



Content:
Front Matter....Pages I-XI
Introduction....Pages 1-4
The Application of Beam and Diffraction Techniques to Thin Film and Surface Micro-Analysis....Pages 5-38
Depth Profile and Interface Analysis of Thin Films by AES and XPS....Pages 39-61
Secondary Neutral Mass Spectrometry (SNMS) and Its Application to Depth Profile and Interface Analysis....Pages 63-85
In-Situ Laser Measurements of Sputter Rates During SIMS/AES In-Depth Profiling....Pages 87-102
Physical Limitations to Sputter Profiling at Interfaces — Model Experiments with Ge/Si Using KARMA....Pages 103-139
Depth Resolution and Quantitative Evaluation of AES Sputtering Profiles....Pages 141-158
The Theory of Recoil Mixing in Solids....Pages 159-200
Back Matter....Pages 201-208
....
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