Ebook: Emerging Technologies for In Situ Processing
- Tags: Characterization and Evaluation of Materials, Electrical Engineering
- Series: NATO ASI Series 139
- Year: 1988
- Publisher: Springer Netherlands
- Edition: 1
- Language: English
- pdf
Content:
Front Matter....Pages i-x
In-Situ Processing Combining MBE, Lithography and Ion Implantation....Pages 1-11
Motivations and Early Demonstrations for In-Situ Processings for III — V Semiconductor Devices....Pages 13-21
Laser Etching and Microelectronic Applications....Pages 23-31
Laser-Induced Chemical Processing of Materials....Pages 33-43
High Technology Manufacturing: Critical Issues for the Future....Pages 45-54
Ultra High Vacuum Processing: MBE....Pages 55-60
Epitaxial Growth of III-V Materials on Implanted III-V Substrates....Pages 61-70
Mechanisms of Laser-Induced Deposition from the Gas Phase....Pages 71-81
Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of Platinum....Pages 83-91
Excimer Laser Projection Patterning....Pages 93-104
Excimer Laser Patterning And Etching Of Metals....Pages 105-112
Ion Projection Lithography....Pages 113-120
UV Light-Assisted Deposition of Al on Si from TMA....Pages 121-129
E-Beam Induced Decomposition of Inorganic Solids....Pages 131-136
Electronic Connection Through Silicon Wafers....Pages 137-143
The Development and use of Novel Precursors for Photolytic Deposition of Dielectric Films....Pages 145-152
Focused Ion Beam Induced Deposition....Pages 153-161
Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks....Pages 163-169
Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation....Pages 171-178
Focused Ion Beam Technology and Applications....Pages 179-199
Laser Direct Writing for Device Applications....Pages 201-211
Laser-Induced Photoetching of Semiconductors with Chlorine....Pages 213-220
Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication....Pages 221-232
Synthesis and Characterization of Laser Driven Powders....Pages 233-240
Physical Properties of Laser Written Chromium Oxide Thin Films....Pages 241-247
Uv Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime....Pages 249-256
Laser Assisted Plasma Etching Of Silicon Dioxide....Pages 257-264
Nd: YAG Laser Processing for Circuit Modification and Direct Writing of Silicon Conductors....Pages 265-271
Study of Excimer Laser Enhanced Etching of Copper and Silicon with (Sub) Monolayer Coverages of Chlorine....Pages 273-278
Surface Chemical Probes and their Application to the Study of in Situ Semiconductor Processing....Pages 279-288
Back Matter....Pages 289-290
Content:
Front Matter....Pages i-x
In-Situ Processing Combining MBE, Lithography and Ion Implantation....Pages 1-11
Motivations and Early Demonstrations for In-Situ Processings for III — V Semiconductor Devices....Pages 13-21
Laser Etching and Microelectronic Applications....Pages 23-31
Laser-Induced Chemical Processing of Materials....Pages 33-43
High Technology Manufacturing: Critical Issues for the Future....Pages 45-54
Ultra High Vacuum Processing: MBE....Pages 55-60
Epitaxial Growth of III-V Materials on Implanted III-V Substrates....Pages 61-70
Mechanisms of Laser-Induced Deposition from the Gas Phase....Pages 71-81
Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition Of Platinum....Pages 83-91
Excimer Laser Projection Patterning....Pages 93-104
Excimer Laser Patterning And Etching Of Metals....Pages 105-112
Ion Projection Lithography....Pages 113-120
UV Light-Assisted Deposition of Al on Si from TMA....Pages 121-129
E-Beam Induced Decomposition of Inorganic Solids....Pages 131-136
Electronic Connection Through Silicon Wafers....Pages 137-143
The Development and use of Novel Precursors for Photolytic Deposition of Dielectric Films....Pages 145-152
Focused Ion Beam Induced Deposition....Pages 153-161
Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks....Pages 163-169
Confirmation of the Wavelength Dependence of Silicon Oxidation Induced by Visible Radiation....Pages 171-178
Focused Ion Beam Technology and Applications....Pages 179-199
Laser Direct Writing for Device Applications....Pages 201-211
Laser-Induced Photoetching of Semiconductors with Chlorine....Pages 213-220
Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication....Pages 221-232
Synthesis and Characterization of Laser Driven Powders....Pages 233-240
Physical Properties of Laser Written Chromium Oxide Thin Films....Pages 241-247
Uv Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime....Pages 249-256
Laser Assisted Plasma Etching Of Silicon Dioxide....Pages 257-264
Nd: YAG Laser Processing for Circuit Modification and Direct Writing of Silicon Conductors....Pages 265-271
Study of Excimer Laser Enhanced Etching of Copper and Silicon with (Sub) Monolayer Coverages of Chlorine....Pages 273-278
Surface Chemical Probes and their Application to the Study of in Situ Semiconductor Processing....Pages 279-288
Back Matter....Pages 289-290
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