Ebook: Noncontact Atomic Force Microscopy
- Tags: Nanotechnology, Surfaces and Interfaces Thin Films, Measurement Science and Instrumentation, Characterization and Evaluation of Materials
- Series: NanoScience and Technology
- Year: 2002
- Publisher: Springer-Verlag Berlin Heidelberg
- Edition: 1
- Language: English
- pdf
Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.
Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.
Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.
Content:
Front Matter....Pages I-XVIII
Introduction....Pages 1-10
Principle of NC-AFM....Pages 11-46
Semiconductor Surfaces....Pages 47-77
Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductor Surfaces....Pages 79-92
Alkali Halides....Pages 93-107
Atomic Resolution Imaging on Fluorides....Pages 109-123
Atomically Resolved Imaging of a NiO(001) Surface....Pages 125-134
Atomic Structure, Order and Disorder on High Temperature Reconstructed ?-Al2O3(0001)....Pages 135-145
NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides....Pages 147-165
Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces....Pages 167-181
NC-AFM Imaging of Adsorbed Molecules....Pages 183-192
Organic Molecular Films....Pages 193-213
Single-Molecule Analysis....Pages 215-231
Low-Temperature Measurements: Principles, Instrumentation, and Application....Pages 233-256
Theory of Non-Contact Atomic Force Microscopy....Pages 257-278
Chemical Interaction in NC-AFM on Semiconductor Surfaces....Pages 279-304
Contrast Mechanisms on Insulating Surfaces....Pages 305-347
Analysis of Microscopy and Spectroscopy Experiments....Pages 349-369
Theory of Energy Dissipation into Surface Vibrations....Pages 371-394
Measurement of Dissipation Induced by Tip-Sample Interactions....Pages 395-431
Back Matter....Pages 433-440
Since 1995, the noncontact atomic force microscope (NC-AFM) has achieved remarkable progress. Based on nanomechanical methods, the NC-AFM detects the weak attractive force between the tip of a cantilever and a sample surface. This method has the following characteristics: it has true atomic resolution; it can measure atomic force interactions, i.e. it can be used in so-called atomic force spectroscopy (AFS); it can also be used to study insulators; and it can measure mechanical responses such as elastic deformation. This is the first book that deals with all of the emerging NC-AFM issues.
Content:
Front Matter....Pages I-XVIII
Introduction....Pages 1-10
Principle of NC-AFM....Pages 11-46
Semiconductor Surfaces....Pages 47-77
Bias Dependence of NC-AFM Images and Tunneling Current Variations on Semiconductor Surfaces....Pages 79-92
Alkali Halides....Pages 93-107
Atomic Resolution Imaging on Fluorides....Pages 109-123
Atomically Resolved Imaging of a NiO(001) Surface....Pages 125-134
Atomic Structure, Order and Disorder on High Temperature Reconstructed ?-Al2O3(0001)....Pages 135-145
NC-AFM Imaging of Surface Reconstructions and Metal Growth on Oxides....Pages 147-165
Atoms and Molecules on TiO2(110) and CeO2(111) Surfaces....Pages 167-181
NC-AFM Imaging of Adsorbed Molecules....Pages 183-192
Organic Molecular Films....Pages 193-213
Single-Molecule Analysis....Pages 215-231
Low-Temperature Measurements: Principles, Instrumentation, and Application....Pages 233-256
Theory of Non-Contact Atomic Force Microscopy....Pages 257-278
Chemical Interaction in NC-AFM on Semiconductor Surfaces....Pages 279-304
Contrast Mechanisms on Insulating Surfaces....Pages 305-347
Analysis of Microscopy and Spectroscopy Experiments....Pages 349-369
Theory of Energy Dissipation into Surface Vibrations....Pages 371-394
Measurement of Dissipation Induced by Tip-Sample Interactions....Pages 395-431
Back Matter....Pages 433-440
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