Ebook: Fundamentals of Nanoscale Film Analysis
- Tags: Characterization and Evaluation of Materials, Surfaces and Interfaces Thin Films, Nanotechnology, Solid State Physics and Spectroscopy, Condensed Matter, Electronics and Microelectronics Instrumentation
- Year: 2007
- Publisher: Springer US
- Edition: 1
- Language: English
- pdf
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.
The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.
Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.
The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.
Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.
The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.
Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
Content:
Front Matter....Pages i-xiv
An Overview: Concepts, Units, and the Bohr Atom....Pages 1-11
Atomic Collisions and Backscattering Spectrometry....Pages 12-33
Energy Loss of Light Ions and Backscattering Depth Profiles....Pages 34-58
Sputter Depth Profiles and Secondary Ion Mass Spectroscopy....Pages 59-83
Ion Channeling....Pages 84-104
Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies....Pages 105-128
X-ray Diffraction....Pages 129-151
Electron Diffraction....Pages 152-173
Photon Absorption in Solids and EXAFS....Pages 174-198
X-ray Photoelectron Spectroscopy....Pages 199-213
Radiative Transitions and the Electron Microprobe....Pages 214-233
Nonradiative Transitions and Auger Electron Spectroscopy....Pages 234-254
Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis....Pages 255-276
Scanning Probe Microscopy....Pages 277-290
Back Matter....Pages 291-338
Modern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons.
The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions.
Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
Content:
Front Matter....Pages i-xiv
An Overview: Concepts, Units, and the Bohr Atom....Pages 1-11
Atomic Collisions and Backscattering Spectrometry....Pages 12-33
Energy Loss of Light Ions and Backscattering Depth Profiles....Pages 34-58
Sputter Depth Profiles and Secondary Ion Mass Spectroscopy....Pages 59-83
Ion Channeling....Pages 84-104
Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies....Pages 105-128
X-ray Diffraction....Pages 129-151
Electron Diffraction....Pages 152-173
Photon Absorption in Solids and EXAFS....Pages 174-198
X-ray Photoelectron Spectroscopy....Pages 199-213
Radiative Transitions and the Electron Microprobe....Pages 214-233
Nonradiative Transitions and Auger Electron Spectroscopy....Pages 234-254
Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis....Pages 255-276
Scanning Probe Microscopy....Pages 277-290
Back Matter....Pages 291-338
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