Ebook: Lithography Process Control
Author: Harry J. Levinson
- Series: SPIE Tutorial Texts in Optical Engineering Vol. TT28
- Year: 1999
- Publisher: SPIE Publications
- Language: English
- pdf
Covers lithography process control at several levels, from fundamental through advanced topics. Self-contained tutorial works both as an introduction to the technology and as a reference for the experienced lithographer. Reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback.
Contents
- Preface
- Introduction to the use of statistical process control in lithography
- Sampling
- Simple and complex processes
- Linewidth control
- Overlay
- Yield
- Process drift and automatic process control
- Metrology
- Control of operations
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